A spin coater is a device used to apply a film to a substrate. The system will rotate the substrate at different speeds while the coating material is distributed to its surface. As the fluid spins off the edge of the substrate, it continues to rotate until the film reaches the desired thickness.It is widely used in various industrial and technical sectors. Compared with other methods, its main advantage is that it can produce very uniform films quickly and easily.
In organic electronics and nanotechnology, the use of spin coating is widespread and is based on many technologies used in other semiconductor industries. However, the relative thin film and high uniformity required for effective device fabrication, as well as the self-assembly and organization required during the casting process, do require some differences in methods.
The spin coating usually refers to uniformly coating a thin film (a few nanometers to a few micrometers) on the surface of a substrate, and coating (casting) a solution of the required material in a solvent ("ink") during rotation. Simply put, it is to deposit a liquid solution on a rotating substrate to produce a thin film of solid material, such as a polymer.
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